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A. The applicant, successors or assigns shall be responsible for complying with all of <br />the stated conditions of approval. <br />B. Construction of the proposed development, as substantially represented by the <br />applicant, or as permitted by the zoning district classification, shall be completed <br />within five (5) years from the effective date of this ordinance. Prior to <br />construction, the applicant, successors or assigns shall secure Final Plan Approval <br />for the proposed development from the Planning Director in accordance with <br />Section 25-2-70, Chapter 25 (Zoning Code), Hawaii County Code. Plans shall <br />identify all proposed structure(s), paved driveway access and parking stalls <br />associated with the proposed development. Landscaping shall be indicated on the <br />plans for the purpose of mitigating any adverse noise or visual impacts to adjacent <br />properties in accordance with the requirements of Planning Department's Rule <br />No. 17 (Landscaping Requirements) standards for CN zones adjoining a RS zone. <br />C. Prior to the issuance of a water commitment by the Department of Water Supply <br />(DWS), the applicant shall submit the anticipated maximum daily water usage <br />calculations as prepared by a professional engineer licensed in the State of <br />Hawaii to the DWS. A water commitment deposit shall be paid to the DWS <br />within 180 days from the effective date of this ordinance in accordance with Rule <br />5 of the Department of Water Supply's Rules and Regulations. The applicant is <br />responsible for maintaining valid water commitments to support the proposed use <br />until such time that required water facilities charges are paid in full. <br />D. The applicant shall install a reduced pressure type backflow prevention assembly <br />within five (5) feet of the existing water meter and any additional water meters on <br />private property, which must be inspected and approved by the Department of <br />Water Supply. Installation of the backflow prevention assembly and relocation <br />-3- <br />